Antimicrobial cleansing compositions containing 2-pyrrolidone-5-carboxylic acid

ABSTRACT

Disclosed are antimicrobial cleansing compositions that have a pH of from about 2.0 to about 5.5 and comprise an antimicrobial agent, an amphoteric sulfactant, and 2-pyrrolidone-5 carboxylic acid as a proton donating agent. Also disclosed are corresponding articles of manufacture and methods of cleansing the skin using the described compositions. The compositions are mild to the skin and provide improved antimicrobial benefits to the skin.

CROSS REFERENCES TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional Application Nos.60/177,092 and 60/177,091, filed on January 20, and 60/191,939, filed onMar. 24, 2000.

TECHNICAL FIELD

The present invention relates to antimicrobial cleansing compositionscomprising an antimicrobial agent, an amphoteric surfactant, and2-pyrrolidone-5 carboxylic acid, wherein the composition providesimmediate and residual antimicrobial activity on the applied areas ofthe skin. The present invention also relates to corresponding articlesof manufacture and methods of cleansing the skin using the compositionsof the present invention.

BACKGROUND OF THE INVENTION

Human health is impacted by many microbial entities. Inoculation byviruses and bacteria cause a wide variety of sicknesses and ailments.Media attention to cases of food poisoning, strep infections, and thelike is increasing public awareness of microbial issues.

It is well known that the washing of hard surfaces, food (e.g. fruit orvegetables) and skin, especially the hands, with antimicrobial ornon-medicated soap, can remove many viruses and bacteria from the washedsurfaces. Removal of the viruses and bacteria is due to the surfactancyof the soap and the mechanical action of the wash procedure. Therefore,it is known and recommended that the people wash frequently to reducethe spread of viruses and bacteria.

Bacteria found on the skin can be divided into two groups: resident andtransient bacteria. Resident bacteria are Gram positive bacteria whichare established as permanent microcolonies on the surface and outermostlayers of the skin and play an important, helpful role in preventing thecolonization of other, more harmful bacteria and fungi.

Transient bacteria are bacteria which are not part of the normalresident flora of the skin, but can be deposited when airbornecontaminated material lands on the skin or when contaminated material isbrought into physical contact with it. Transient bacteria are typicallydivided into two subclasses: Gram positive and Gram negative. Grampositive bacteria include pathogens such as Staphylococcus aureus,Streptococcus pyogenes and Clostridiutn botulinum. Gram negativebacteria include pathogens such as Salmonella, Escherichia coli,Klebsiella, Haemophilius, Pseudomonas aeruginosa, Proteus and Shigelladysenteriae. Gram negative bacteria are generally distinguished fromGram positive by an additional protective cell membrane which generallyresults in the Gram negative bacteria being less susceptible to topicalantibacterial actives.

Antimicrobial cleansing products have been marketed in a variety offorms for some time. Forms include deodorant soaps, hard surfacecleaners, and surgical disinfectants. These traditional rinse-offantimicrobial products have been formulated to provide bacteriareduction during washing. For example, Dial® liquid soaps, when used inhand washing, have been found to reduce the amount of the bacteria onthe skin by from about 2.0 log (97%) to about 2.5 log (99.7%) in one 30second handwash, as measured by standard Health Care Personal HandwashTests (HCPHWT). That is skin washed with these soaps were contaminatedwith only 0.3%-3% |of the number of bacteria compared to before washing.Antimicrobial liquid cleansers are disclosed in U.S. Pat. No. 4,847,072,Bissett et al., issued Jul. 11, 1989, U.S. Pat. No. 4,939,284,Degenhardt, issued Jul. 3, 1990 and U.S. Pat. No. 4,820,698, Degenhardt,issued Apr. 11, 1989, all of which are incorporated herein by reference.

Some of these antimicrobial products, especially the hard surfacecleaners and surgical disinfectants, utilize high levels of alcoholand/or harsh surfactants which have been shown to dry out and irritateskin tissues. Dial® bar soap has been found to provide from 2.5 to 3.0log reduction in bacteria in one wash, as measured by the HCPHWT.However, Dial® can be drying to the skin with repeated use. Hibiclens®Surgical Scrub provides 2.5 to 3.0 log reduction in germs in one wash,however it utilizes a potent cationic antibacterial agent,chlorohexidine, which has product safety concerns. Ideal personalcleansers should gently cleanse the skin, cause little or no irritation,and not leave the skin overly dry after frequent use and preferablyshould provide a moisturizing benefit to the skin.

Given the health impacts of bacteria like Staphylococcus aureus,Streptococcus pyogenes and Clostridium botulinum, it would be highlydesirable to formulate antimicrobial cleansing products which providesimprove germ reduction on the skin, which are mild to the skin and whichcan be used without water. Existing products have been unable to deliverall of these benefits.

It has now been found that the antimicrobial cleansing compositions ofthe present invention can be formulated to provide improved mildness tothe skin and improved antibacterial, antiviral, and/or antifungalactivity, wherein the compositions comprise an antibacterial active,2-pyrrolidone-5 carboxylic acid, and an amphoteric surfactant, all ofwhich are deposited on the skin. The 2-pyrrolidone-5 carboxylic acid andamphoteric surfactant enhance the selected active, to provide a newlevel of hostility to bacteria contacting the skin.

SUMMARY OF THE INVENTION

The present invention relates to antimicrobial cleansing compositions,wherein the compositions comprise from about 0.001% to about 5.0% byweight of an antimicrobial active; from about 0.05% to about 10% byweight of an amphoteric surfactant; from about 0.1% to about 10%, byweight of 2-pyrrolidone-5 carboxylic acid; and from about 3% to about99.89% by weight an aqueous component. The cleansing compositions of thepresent invention have a pH in the range of about 2.0 to about 5.5. Thepresent invention also relates to articles of manufacture and methods ofcleansing the skin comprising the disclosed compositions.

DETAILED DESCRIPTION OF THE INVENTION

The antimicrobial cleansing compositions of the present invention arehighly efficacious for providing an improved germ reduction on the skin,are mild to the skin and can be used without additional available water.

The term “safe and effective amount” as used herein means an amount of acompound or composition sufficient to significantly induce a positivebenefit, preferably an antimicrobial benefit, but low enough to avoidserious side effects, i.e., to provide a reasonable benefit to riskratio, within the scope of sound judgment of the skilled artisan.

All percentages and ratios used herein, unless otherwise indicated, areby weight and all measurements made are at 25° C., unless otherwisedesignated. The invention hereof can comprise, consist of, or consistessentially of, the essential as well as optional ingredients andcomponents described therein.

The antimicrobial cleansing composition of the present inventioncomprise the following essential components, which components areselected so that the efficacy and optional mildness requirementshereinafter defined for the compositions herein are preferably met. Theselection of each component is necessarily dependent on the selection ofeach of the other components. If a harsh surfactant is utilized, then amildness agent may have to be utilized. Guidelines for the selection ofthe individual components are provided herein.

The Antimicrobial Active

The antimicrobial cleansing composition of the present inventioncomprise an antimicrobial active at concentrations ranging from about0.001% to about 5%, preferably from about 0.05% to about 1%, morepreferably from about 0.05% to about 0.5%, even more preferably fromabout 0.1% to about 0.25%, by weight of composition. The exact amount ofantibacterial active to be used in the compositions will depend uponfactors such as the particular active utilized since actives vary inpotency.

Given below are examples of non-cationic antimicrobial agents which areuseful in the compositions of the present invention.

Pyrithiones, especially the zinc complex (ZPT)

Benzalkonium Chloride

Di(C₆-C₁₄)alkyl di short chain (C₁₋₄ alkyl and/or hydroxyalkyl)

N-(3-chloroallyl) hexaminium chlorides

Benzethonium chloride

Methylbenzethonium

Octopirox®

Dimethyldimethylol Hydantoin (Glydant®)

Methylchloroisothiazolinone/methylisothiazolinone (Kathon CG®)

Sodium Sulfite

Sodium Bisulfite

Imidazolidinyl Urea (Germall 115®)

Diazolidinyl Urea (Germaill II®)

Benzyl Alcohol

2-Bromo-2-nitropropane-1,3-diol (Bronopol®)

Formalin (formaldehyde)

Iodopropenyl Butylcarbamate (Polyphase P100®)

Chloroacetamide

Methanamine

Methyldibromonitrile Glutaronitrile (1,2-Dibromo-2,4-dicyanobutane orTektamer®)

Glutaraldehyde

5-bromo-5-nitro-1,3-dioxane (Bronidox®)

Phenethyl Alcohol

o-Phenylphenol/sodium o-phenylphenol

Sodium Hydroxymethylglycinate (Suttocide A®)

Polymethoxy Bicyclic Oxazolidine (Nuosept C®)

Dimethoxane

Thimersal

Dichlorobenzyl Alcohol

Captan

Chlorphenenesin

Dichlorophene

Chlorbutanol

Glyceryl Laurate

Halogenated Diphenyl Ethers

2,4,4′-trichloro-2′-hydroxy-diphenyl ether (Triclosan® or TCS)

2,2′-dihydroxy-5,5′-dibromo-diphenyl ether

Phenolic Compounds

Phenol

2-Methyl Phenol

3-Methyl Phenol

4-Methyl Phenol

4-Ethyl Phenol

2,4-Dimethyl Phenol

2,5-Dimethyl Phenol

3,4-Dimethyl Phenol

2,6-Dimethyl Phenol

4-n-Propyl Phenol

4-n-Butyl Phenol

4-n-Amyl Phenol

4-tert-Amyl Phenol

4-n-Hexyl Phenol

4-n-Heptyl Phenol

Mono- and Poly-Alkyl and Aromatic Halophenols

p-Chlorophenol

Methyl p-Chlorophenol

Ethyl p-Chlorophenol

n-Propyl p-Chlorophenol

n-Butyl p-Chlorophenol

n-Amyl p-Chlorophenol

sec-Amyl p-Chlorophenol

n-Hexyl p-Chlorophenol

Cyclohexyl p-Chlorophenol

n-Heptyl p-Chlorophenol

n-Octyl p-Chlorophenol

o-Chlorophenol

Methyl o-Chlorophenol

Ethyl o-Chlorophenol

n-Propyl o-Chlorophenol

n-Butyl o-Chlorophenol

n-Amyl o-Chlorophenol

tert-Amyl o-Chlorophenol

n-Hexyl o-Chlorophenol

n-Heptyl o-Chlorophenol

o-Benzyl p-Chlorophenol

o-Benxyl-m-methyl p-Chlorophenol

o-Benzyl-m, m-dimethyl p-Chlorophenol

o-Phenylethyl p-Chlorophenol

o-Phenylethyl-m-methyl p-Chlorophenol

3-Methyl p-Chlorophenol

3,5-Dimethyl p-Chlorophenol

6-Ethyl-3-methyl p-Chlorophenol

6-n-Propyl-3-methyl p-Chlorophenol

6-iso-Propyl-3-methyl p-Chlorophenol

2-Ethyl-3,5-dimethyl p-Chlorophenol

6-sec-Butyl-3-methyl p-Chlorophenol

2-iso-Propyl-3,5-dimethyl p-Chlorophenol

6-Diethylmethyl-3-methyl p-Chlorophenol

6-iso-Propyl-2-ethyl-3-methyl p-Chlorophenol

2-sec-Amyl-3,5-dimethyl p-Chlorophenol

2-Diethylmethyl-3,5-dimethyl p-Chlorophenol

6-sec-Octyl-3-methyl p-Chlorophenol

p-Chloro-m-cresol

p-Bromophenol

Methyl p-Bromophenol

Ethyl p-Bromophenol

n-Propyl p-Bromophenol

n-Butyl p-Bromophenol

n-Amyl p-Bromophenol

sec-Amyl p-Bromophenol

n-Hexyl p-Bromophenol

Cyclohexyl p-Bromophenol

o-Bromophenol

tert-Amyl o-Bromophenol

n-Hexyl o-Bromophenol

n-Propyl-m,m-Dimethyl o-Bromophenol

2-Phenyl Phenol

4-Chloro-2-methyl phenol

4-Chloro-3-methyl phenol

4-Chloro-3,5-dimethyl phenol

2,4-Dichloro-3,5-dimethylphenol

3,4,5,6-Terabromo-2-methylphenol

5-Methyl-2-pentylphenol

4-Isopropyl-3-methylphenol

Para-chloro-meta-xylenol (PCMX)

Chlorothymol

Phenoxyethanol

Phenoxyisopropanol

5-Chloro-2-hydroxydiphenylmethane

Resorcinol and its Derivatives

Resorcinol

Methyl Resorcinol

Ethyl Resorcinol

n-Propyl Resorcinol

n-Butyl Resorcinol

n-Amyl Resorcinol

n-Hexyl Resorcinol

n-Heptyl Resorcinol

n-Octyl Resorcinol

n-Nonyl Resorcinol

Phenyl Resorcinol

Benzyl Resorcinol

Phenylethyl Resorcinol

Phenylpropyl Resorcinol

p-Chlorobenzyl Resorcinol

5-Chloro 2,4-Dihydroxydiphenyl Methane

4′-Chloro 2,4-Dihydroxydiphenyl Methane

5-Bromo 2,4-Dihydroxydiphenyl Methane

4′-Bromo 2,4-Dihydroxydiphenyl Methane

Bisphenolic Compounds

2,2′-Methylene bis (4-chlorophenol)

2,2′-Methylene bis (3,4,6-trichlorophenol)

2,2′-Methylene bis (4-chloro-6-bromophenol)

bis (2-hydroxy-3,5-dichlorophenyl) sulphide

bis (2-hydroxy-5-chlorobenzyl)sulphide

Benzoic Esters (Parabens)

Methylparaben

Propylparaben

Butylparaben

Ethylparaben

Isopropylparaben

Isobutylparaben

Benzylparaben

Sodium Methylparaben

Sodium Propylparaben

Halogenated Carbanilides

3,4,4′-Trichlorocarbanilides (Triclocarban® or TCC)

3-Trifluoromethyl4,4′-dichlorocarbanilide

3,3′,4-Trichlorocarbanilide

A more detailed description of suitable antimicrobial agents can befound in U.S. Pat. No. 4,163,800; U.S. Pat. No. 3,152,181; U.S. Pat. No.5,780,064; and Remington's pharmaceutical Sciences, 17^(th) ed. (AlfonsoR. Gennaro ed., 1985) pp. 1158-1169, which descriptions are incorporatedherein by reference.

Another class of antibacterial agents, which are useful in the presentinvention, are the so-called “natural” antibacterial actives, referredto as natural essential oils. These actives derive their names fromtheir natural occurrence in plants. Typical natural essential oilantibacterial actives include oils of anise, lemon, orange, rosemary,wintergreen, thyme, lavender, cloves, hops, tea tree, citronella, wheat,barley, lemongrass, cedar leaf, cedarwood, cinnamon, fleagrass,geranium, sandalwood, violet, cranberry, eucalyptus, vervain,peppermint, gum benzoin, basil, fennel, fir, balsam, menthol, ocmeaoriganum, Hydastis carradenisis, Berberidaceae daceae, Ratanhiae andCurcunta longa. Also included in this class of natural essential oilsare the key chemical components of the plant oils which have been foundto provide the antimicrobial benefit. These chemicals include, but arenot limited to anethol, catechole, camphene, carvacol, eugenol,eucalyptol, ferulic acid, farnesol, hinokitiol, tropolone, limonene,menthol, methyl salicylate, thymol, terpineol, verbenone, berberine,ratanhiae extract, caryophellene oxide, citronellic acid, curcumin,nerolidol and geraniol.

Other suitable antimicrobial actives include antibacterial metal salts.This class generally includes salts of metals in groups 3b-7b, 8 and3a-5a. Specifically are the salts of aluminum, zirconium, zinc, silver,gold, copper, lanthanum, tin, mercury, bismuth, selenium, strontium,scandium, yttrium, cerium, praseodymiun, neodymium, promethum, samarium,europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium,ytterbium, lutetium and mixtures thereof

Preferred antimicrobial actives for use herein include benzalkoniumchloride, benzethonium chloride, triclosan, triclocarban, octopirox,PCMX, ZPT, natural essential oils and their key ingredients, andmixtures thereof The most preferred antimicrobial active for use in thecompositions of the present invention is Benzalkonium Chloride®.

Amphoteric Surfactant

The antimicrobial cleansing compositions of the present inventioncomprise an amphoteric surfactant at concentrations ranging from about0.01% to about 20%, preferably from about 0.05% to about 10%, morepreferably from about 0.05% to about 10%, by weight of the cleansingcomposition.

Amphoteric surfactants useful in the present invention are those havingthe following general formulae (I) (II), (III), (IV) and (V) andmixtures thereof:

wherein R¹ is an alkyl, alkenyl, aryl, or hydroxyalkyl radical of fromabout 8 to about 22 carbon atoms, optionally interrupted with up toabout 10 ethylene oxide moieties and/or 1 glyceryl moiety, R² and R³ areindividually selected from alkyl and monohydroxyalkyl groups containingfrom about 1 to about 3 carbon atoms, R⁴ is alkylene, or hydroxyalkyleneof from about 1 to about 4 carbon atoms, Z¹ is a radical selected fromcarboxylate, sulfonate, sulfate, phosphate, or phosphonate, x is 0 or 1,n is from about 1 to about 6, and m is 0 or 1. Preferably, R¹ is analkyl, alkenyl, or hydroxyalkyl radical of from 11 to 17 carbon atoms,R² and R³ are individually selected from alkyl groups containing of from1 to 3 carbon atoms, R⁴ is alkylene or hydroxyalkylene of from 1 to 2carbon atoms, Z¹ is a radical selected from carboxylate, sulfonate, x is0 or 1, n is 1 to 3, and m is 0 or 1.

wherein R⁵ is C₈-C₂₂ alkyl, alkenyl, aryl, or hydroxyalkyl, preferablyC₈-C₂₂, R⁶ is hydrogen or CH₂CO₂M¹, R⁷ is CH₂CH₂OH orCH₂CH₂OCH₂CH₂COOM¹, R⁸ is hydrogen, CH₂CH₂OH, or CH₂CH₂OCH₂CH₂COOM¹, Z²is CO₂M¹ or CH₂CO₂M¹, y is 2 or 3, preferably 2, M¹ is hydrogen or acation, such as alkali metal, alkaline earth metal, ammonium, alkanolammonium, sulfate, sulfonate, phosphate, or phosphonate.

R⁹—NH(CH₂)_(a)COOM²  (III)

R⁹—N[(CH₂)_(a)COOM²]₂  (IV)

wherein a is a number from 1 to 4, R⁹ is C₈-C₂₂ alkyl, alkenyl, aryl,hydroxyalkyl or alkylamidoalkyls, and M² is hydrogen, alkali metal,alkaline earth metal, ammonium or alkanolammonium.

wherein R¹⁰ or R¹² is methyl, ethyl, or hydroxyethyl, and R¹¹ is C₈-C₂₂alkyl, alkenyl, or aryl, or CH₃(CH₂)pCONH(CH₂)q wherein p is 8-22 and qis 1-6. Preferably, R¹⁰ and R¹² are methyl, R¹¹ is C₁₀₋₁₈ alkyl,alkenyl, p is 11-17, and q is 1-3.

Examples of amphoteric surfactants useful in the antimicrobial cleansingcompositions having general formula (I) are amide betaines, amide sulfobetaines, alkyl betaines, alkenyl betaines, sultaines (sulfo betaines),and imidazolinium betaines. Examples of amphoteric surfactantsparticularly useful are high alkyl betaines, such as coco dimethylcarboxymethyl betaine, cocamidopropyl betaine under the trade name ofTEGO BETAINE, coco betaine, lauryl betaine under the trade nameREWOTERIC AM DML-35, lauryl amidopropyl betaine, oleyl betaine, lauryldimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxyethylbetaine, cetyl dimethyl carboxymethyl betaine, laurylbis-(2-hydroxyethyl) carboxymethyl betaine, stearylbis-(2-hydroxypropyl) carboxymethyl betaine, oleyl dimethylgamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl)alpha-carboxyethyl betaine, cocamidopropyl hydroxy sultaine(sulfobetaine), lauryl sultaine (lauryl sulfobetaine), andcocamidopropryl hydroxy sultaine under the trade name REWOTERIC AM CAS.

Examples of amphoteric surfactants useful in the antimicrobial cleansingcompositions having general formula (II) are marketed under the tradename MIRANOL and are understood to comprise a complex mixture ofspecies, and can exist in protonated and non-protonated speciesdepending upon pH with respect to species that can have a hydrogen atR⁶. The imidazolinium amphoteric surfactant hereof can be derived via animidazolinium intermediate.

Preferred amphoteric surfactants of formula (II) are monocarboxylatesand dicarboxylates. Examples of these materials includecocoamphocarboxypropionate, cocoamphocarboxypropionic acid,cocoamphocarboxyglycinate (alternately referred to ascocoamphodiacetate), and cocoamphoacetate.

Specific commercial products providing the imidazolinium derivativecomponent of the present compositions include those sold under the tradenames MIRANOL C2M CONC. N.P., MIRANOL C2M CONC. O.P., MIRANOL C2M SF,MIRANOL CM SPECIAL (Miranol, Inc.); ALKATERIC 2CIP (Alkaril Chemicals);cocoamphocarboxy propionate under the trade name NIKKOL AM-101,AMPHOTERGE W-2 (Lonza, Inc.); MONATERIC CDX-38, MONATERIC CSH-32 (MonaIndustries); REWOTERIC AM-2C (Rewo Chemical Group); and SCHEROTERIC MS-2(Scher Chemicals).

Examples of amphoteric surfactants useful in the antimicrobial cleansingcompositions having general formulae (III) and (IV) includen-alkylaminopropionates and n-alkyliminodipropionates. Such materialsare sold under the trade name DERIPHAT by Henkel and MIRATAINE byMiranol, Inc. Specific examples include N-lauryl-beta-amino propionicacid or salts thereof, and N-lauryl-beta-imino-dipropionic acid or saltsthereof.

Examples of amphoteric surfactants useful in the antimicrobial cleansingcompositions having general formula (V) are commonly known as amineoxides. Also useful are tertiary phosphine oxides and dialkylsulfoxides. Mixtures of the above amphoteric surfactants can also beused.

The most preferred amphoteric surfactants are amine oxides. Examples ofamine oxides particularly useful in the antimicrobial cleansingcompositions are cocamine oxide, lauramine oxide under the trade nameAMMONYX LO, and stearamidopropylamine oxide under the trade name VAROX1770.

2-pyrrolidone-5 Carboxylic Acid

The antimicrobial cleansing compositions of the present inventioncomprise 2-pyrrolidone-5 carboxylic acid as a proton donating agent atconcentrations ranging from about 0.1% to about 20%, preferably fromabout 0.1% to about 10%, more preferably from about 0.5% to about 8%,and most preferably from about 1% to about 5%, by weight of thecomposition.

The term “proton donating agent” as used herein refers to the2-pyrrolidone-5 carboxylic acid component of the cleansing compositionsthat is ultimatile applied topically to the skin and that results inundissociated acid on the applied area of the skin after application.This particular proton donating agent remains at least partiallyundissociated in the neat composition and when the compositions arediluted during washing and rinsing. This particular proton donatingagent can be added directly to the cleansing composition in the acidform or can be formed by adding the conjugate base of the desired acidand a sufficient amount of a separate acid strong enough to form theundissociated acid from the base.

Composition pH

It is critical to achieving the benefits of the invention that theundissociated acid from the selected proton donating agent(2-pyrrolidone-5 carboxylic acid as deposited or formed in-situ) remainon the skin in the protonated form. Therefore, the pH of the cleansingcompositions of the present invention must be adjusted to a sufficientlylow level in order to either form or deposit substantial undissociatedacid on the skin. The pH of the compositions should be adjusted andpreferably buffered to range from about 2.0 to about 5.5, preferablyfrom about 2.5 to about 5.0 and more preferably from about 2.5 to about4.5.

It has been found that 2-pyrrolidone-5 carboxylic acid as the selectedproton donating agent in the compositions of the present invention ismilder to the skin and causes less stinging than many other acids thatare likewise suitable for topical application to the skin.

Aqueous Component

The cleansing compositions described herein additionally comprise anaqueous component. For purposes of this invention the term “aqueouscomponent” refers to any material consisting essentially of, orpredominantly of water, water soluble alcohol(s) such as ethanol,propanol or isopropanol, and mixtures thereof.

The aqueous component can optionally contain one or more water-solubleemollients including, but not limited to, lower molecular weightaliphatic diols such as propylene glycol and butylene glycol; polyolssuch as glycerine and sorbitol; and polyoxyethylene polymers such aspolyethylene glycol 200. The specific type and amount of water solubleemollient(s) employed will vary depending on the desired aestheticcharacteristics of the composition, and is readily determined by oneskilled in the art.

The aqueous component is preferably water which is deionized, distilledor purified. Preferred cleansing compositions comprise from about 3% toabout 99%, preferably from about 5% to about 98%, more preferably fromabout 10% to about 97.5%, and most preferably from about 38% to about95.99% , by weight of the aqueous component.

Preferable Optional Ingredients

Mildness Enhancers

In order to achieve the mildness required of the present invention,optional ingredients to enhance the mildness to the skin can be added.These ingredients include cationic and nonionic polymers,co-surfactants, moisturizers and mixtures thereof. Polymers usefulherein include polyethylene glycols, polypropylene glycols, hydrolyzedsilk proteins, hydrolyzed milk proteins, hydrolyzed keratin proteins,guar hydroxypropyltrimonium chloride, polyquats, silicone polymers andmixtures thereof. When used, the mildness enhancing polymers comprisefrom about 0.1% to about 1%, preferably from about 0.2% to about 1.0%,and more preferably from about 0.2% to about 0.6%, by weight of theantimicrobial cleansing composition, of the composition. Co-surfactantsuseful herein include nonionic surfactants such as the Genapol(® 24series of ethoxylated alcohols, POE(20) sorbitan monooleate (Tween® 80),polyethylene glycol cocoate and Pluronic® propylene oxide/ethylene oxideblock polymers, and amphoteric surfactants such as alkyl betaines, alkylsultaines, alkyl amphoacetates, alkyl amphodiacetates, alkylamphopropionates, and alkyl amphodipropionates. When used, the mildnessenhancing co-surfactants comprise from about 20% to about 70%,preferably from about 20% to about 50%, by weight of theamphotericsurfactant, of the cleansing composition.

Another group of mildness enhancers are lipid skin moisturizing agentswhich provide a moisturizing benefit to the user of the cleansingcomposition when the lipophilic skin moisturizing agent is deposited tothe user's skin. When used in the antimicrobial personal cleansingcompositions herein, lipophilic skin moisturizing agents are used, theyare employed at a level of about 0.1% to about 30%, preferably fromabout 0.2% to about 10%, most preferably from about 0.5% to about 5% byweight of the composition.

In some cases, the lipophilic skin moisturizing agent can desirably bedefined in terms of its solubility parameter, as defined by Vaughan inCosmetics and Toiletries, Vol. 103, p. 47-69, October 1988. A lipophilicskin moisturizing agent having a Vaughan solubility Parameter (VSP) from5 to 10, preferably from 5.5 to 9 is suitable for use in theantimicrobial cleansing compositions herein.

A wide variety of lipid type materials and mixtures of materials aresuitable for use in the antimicrobial cleansing compositions of thepresent invention. Preferably, the lipophilic skin conditioning agent isselected from the group consisting of hydrocarbon oils and waxes,silicones, fatty acid derivatives, cholesterol, cholesterol derivatives,di- and tri-glycerides, vegetable oils, vegetable oil derivatives,liquid nondigestible oils such as those described in U.S. Pat. No.3,600,186 to Mattson; Issued Aug. 17, 1971 and U.S. Pat. Nos. 4,005,195and 4,005,196 to Jandacek et al; both issued Jan. 25, 1977, all of whichare herein incorporated by reference, or blends of liquid digestible ornondigestible oils with solid polyol polyesters such as those describedin U.S. Pat. No. 4,797,300 to Jandacek; issued Jan. 10, 1989; U.S. Pat.Nos. 5,306,514, 5,306,516 and 5,306,515 to Letton; all issued Apr. 26,1994, all of which are herein incorporated by reference, andacetoglyceride esters, alkyl esters, alkenyl esters, lanolin and itsderivatives, milk tri-glycerides, wax esters, beeswax derivatives,sterols, phospholipids and mixtures thereof. Fatty acids, fatty acidsoaps and water soluble polyols are specifically excluded from ourdefinition of a lipophilic skin moisturizing agent.

Hydrocarbon oils and waxes: Some examples are petrolatum, mineral oilmicrocrystalline waxes, polyalkenes (e.g. hydrogenated andnonhydrogenated polybutene and polydecene), paraffins, cerasin,ozokerite, polyethylene and perhydrosqualene. Blends of petrolatum andhydrogenated and nonhydrogenated high molecular weight polybuteneswherein the ratioof petrolatum to polybutene ranges from about 90:10 toabout 40:60 are also suitable for use as the lipid skin moisturizingagent in the compositions herein.

Silicone Oils: Some examples are dimethicone copolyol,dimethylpolysiloxane, diethylpolysiloxane, high molecular weightdimethicone, mixed C1-C30 alkyl polysiloxane, phenyl dimethicone,dimethiconol, and mixtures thereof. More preferred are non-volatilesilicones selected from dimethicone, dimethiconol, mixed C1-C30 alkylpolysiloxane, and mixtures thereof. Nonlimiting examples of siliconesuseful herein are described in U.S. Pat. No. 5,011,68 1, to Ciotti etal., issued Apr. 30, 1991, which is incorporated by reference.

Di- and tri-glycerides: Some examples are castor oil, soy bean oil,derivatized soybean oils such as maleated soy bean oil, safflower oil,cotton seed oil, corn oil, walnut oil, peanut oil, olive oil, cod liveroil, almond oil, avocado oil, palm oil and sesame oil, vegetable oilsand vegetable oil derivatives; coconut oil and derivatized coconut oil,cottonseed oil and derivatized cottonseed oil, jojoba oil, cocoa butter,and the like.

Acetoglyceride esters are used and an example is acetylatedmonoglycerides.

Lanolin and its derivatives are preferred and some examples are lanolin,lanolin oil, lanolin wax, lanolin alcohols, lanolin fatty acids,isopropyl lanolate, acetylated lanolin, acetylated lanolin alcohols,lanolin alcohol linoleate, lanolin alcohol riconoleate.

It is most preferred when at least 75% of the lipophilic skinconditioning agent is comprised of lipids selected from the groupconsisting: petrolatum, blends of petrolatum and high molecular weightpolybutene, mineral oil, liquid nondigestible oils (e.g. liquidcottonseed sucrose octaesters) or blends of liquid digestible ornondigestible oils with solid polyol polyesters (e.g. sucrose octaestersprepared from C22 fatty acids) wherein the ratio of liquid digestible ornondigestible oil to solid polyol polyester ranges from about 96:4 toabout 80:20, hydrogenated or nonhydrogenated polybutene,microcrystalline wax, polyalkene, paraffin, cerasin, ozokerite,polyethylene, perhydrosqualene; dimethicones, alkyl siloxane,polymethylsiloxane, methylphenylpolysiloxane and mixtures thereof. Whenas blend of petrolatum and other lipids is used, the ratio of petrolatumto the other selected lipids (hydrogenated or unhydrogenated polybuteneor polydecene or mineral oil) is preferably from about 10:1 to about1:2, more preferably from about 5:1 to about 1:1.

Degreasing and/or Detackifying Agent

Also essential to the compositions of the present invention aredegreasing and/or detackifying agents in an effective amount to reducethe greasy feel or stickiness associated with the lipophilic skinmoisturizers. The term “degreasing agent,” as used herein, means anagent which prevents, reduces and/or eliminates the greasy or heavy skinfeel typically associated with lipophilic materials. The term“detackifying agent,” as used herein, means an agent which prevents,reduces and/or eliminates the sticky or tacky geeling typicallyassociated with ingredients such as humectants. Degreasing ordetackifying agents suitable for use in the present invention areselected from the group consisting of select silicones, wax materialssoluble in the alcoholic antiseptic and having a melting point greaterthan about 20° C., powders, fluorochemicals and mixtures thereof.

i) Silicones

Useful as degreasing agents in the present invention are volatile andnon-volatile silicone oils. The term “nonvolatile” as used herein meansthat the silicone has a boiling point of at least about 260° C.,preferably at least about 275° C., more preferably at least about 300°C. Such materials exhibit very low or no significant vapor pressure atambient conditions. The term “volatile” as used herein mean that thesilicone has a boiling point of from about 99° C. to about 260° C.

Volatile silicones suitable for use in the present invention aredisclosed in U.S. Pat. No. 4,781,917, issued to Luebbe et al., Nov. 1,1988 and U.S. Pat. No. 5,759,529 to LeGrow et al., issued Jun. 2, 1998,both of which are herein incorporated by reference in their entirety.Additionally, a description of various volatile silicones materials isfound in Todd et al., “Volatile Silicone Fluids for Cosmetics”,Cosmetics and Toiletries, 91:27-32 (1976). Preferred silicones havesurface tensions of less than about 35 dynes, more preferably less thanabout 30 dynes, most preferably less than about 25 dynes. Particularlypreferred volatile silicone oils are selected from the group consistingof cyclic volatile silicones corresponding to the formula:

wherein n is from about 3 to about 7; and linear volatile siliconescorresponding to the formula:

(CH₃)₃Si—O—[Si(CH₃)₂O]._(m)—Si(CH₃)₃

wherein m is from about 1 to about 7. Linear volatile siliconesgenerally have a viscosity of less than about 5 centistokes at25.degree. C., whereas the cyclic silicones have viscosities of lessthan about 10 centistokes at 25.degree. C. Highly preferred examples ofvolatile silicone oils include cyclomethicones of varying viscosities,e.g., Dow Corning 200, Dow Corning 244, Dow Corning 245, Dow Coming 344,and Dow Corning 345, (commercially available from Dow Corning Corp.);SF-1204 and SF-1202 Silicone Fluids (commercially available from G.E.Silicones), GE 7207 and 7158 (commercially available from GeneralElectric Co.); and SWS-03314 (commercially available from SWS SiliconesCorp.). When present in the compositions of the present invention,volatile silicones comprise at least about or greater than about 3% toabout 10%, more preferably from about 4% to about 8%, and mostpreferably from about 6% to about 8% by weight of the present invention.

Also useful as the degreasing agent are nonvolatile silicones such asfluid silicones and gum silicones. The molecular weight and viscosity ofthe particular selected silicone will determine whether it is a gum or afluid. The term “silicone fluid,” as used herein, denotes a siliconewith viscosities ranging from about 5 to about 600,000 centistokes, mostpreferably from about 350 to about 100,000 centistokes, at 25° C. Theterm “silicone gum,” as used herein, denotes silicones with massmolecular weights of from about 200,000 to about 1,000,000 and withviscosities greater than about 600,000 centistokes. The non-volatilesilicones of the present invention preferably have a viscosity of atleast about 15,000 centipoise, more preferably at least 25,000centipoise.

Suitable non-volatile silicones include polysiloxanes and other modifiedsilicones. Polysiloxanes and other modified silicones are described inU.S. Pat. Nos. 5,650,144 and 5,840,288, both of which are hereinincorporated by reference in their entirety. Examples of suitablepolysiloxanes and modified silicones include, but are not limited to,polyalkylsiloxanes, polyarylsiloxanes, polyalkylarylsiloxanes,polyestersiloxanes, polyethersiloxane copolymers, polyfluorosiloxanes,polyaminosiloxanes, and mixtures thereof. Preferred non-volatilepolysiloxanes are polydimethylsiloxane having viscosities of from about5 to about 100,000 centistokes at 25° C.

Silicone fluid and gum mixtures or blends can also be used. Silicone gumand fluid blends are disclosed in U.S. Pat. No. 4,906,459, Cobb et al.,issued Mar. 6, 1990; U.S. Pat. No. 4,788,006, Bolich, Jr. et al., issuedNov. 29, 1988; U.S. Pat. No. 4,741,855, Grote et al., issued May 3,1988; U.S. Pat. No. 4,728,457, Fieler et al., issued Mar. 1, 1988; U.S.Pat. No. 4,704,272, Oh et al., issued Nov. 3. 1987; and U.S. Pat. No.2,826,551, Geen, issued Mar. 11, 1958; U.S. Pat. No. 5,154,849, Visscheret al., issued Oct. 13, 1992, all of which are herein incorporated byreference in their entirety.

When present in the compositions of the present invention, non-volatilesilicones comprise from about 0.01% to about 5%, preferably from about0.1% to about 2%, more preferably from about 0.1% to about 1% by weightof the present invention.

Silicone elastomers are also useful as degreasing agents in the presentinvention. Suitable silicone elastomers are illustrated in U.S. Pat. No.5,654,362, herein incorporated by reference in its entirety. Examples ofsuitable elastomers include, but are not limited to, dimethiconecrosspolymer, dimethicone/vinyidimethicone crosspolymer, polysilicone-11and mixtures thereof. Such elastomers can be used alone or with volatileor nonvolatile solvents. Examples of suitable solvents include, but arenot limited to, volatile silicones, volatile alcohols, volatile esters,volatile hydrocarbons, and mixtures thereof. The silicone elastomers arecrosslinked and preferably have a weight average molecular weightgreater than about 100,000. Preferred for use herein areelastomer/solvent blends having an elastomer to solvent ratio of fromabout 1:100 to about 1:1, more preferably from about 1:30 to about 1:5.Preferably the silicone elastomer blend has a viscosity of from about50,000 centipoise to about 400,000 centipoise, more preferably fromabout 100,000 centipoise to about 300, 000 centipoise.

Examples of suitable silicone elastomer blends include cyclomethiconeand dimethicone crosspolymer blend (Dow Corning®9040 siliconeelastomer); cyclomethicone and dimethicone/vinyidimethicone crosspolymer blend (SFE 839 elastomer dispersion available from GE);octamethylcyclotetrasiloxane and polysilicone-11 blend (Gransil GCMavailable from Shin Etsu); and mixtures thereof. Preferred herein is thecyclomethicone and dimethicone/vinyidimethicone cross polymer blend.

When present, the silicone elastomer preferably comprises from about0.01% to about 5%, preferably from about 0.1% to about 2%.

When present, silicone elastomer or gum blends preferably comprise fromabout 0.1% to about 10%, preferably from about 1% to about 10%, mostpreferably from about 4% to about 10% by weight of the composition.

ii.) Wax Materials

Wax materials used herein preferably have melting points of at leastabout or greater than about 20° C., more preferably at least about orgreater than about 25° C., and still more preferably at least about orgreater than 32° C., and most preferably at least about or greater thanabout 35° C. The wax materials are preferably soluble in the alcoholantiseptic. The phrase “soluble in the alcohol antiseptic,” as usedherein, means the wax materials is soluble in the alcohol antiseptic, at25° C., at a concentration of 0.1%, preferably 0.2%, more preferably0.4% by weight, and most preferably soluble at 1.0% by weight. Examplesof suitable wax materials include, but are not limited to, dimethiconecopolyols having a weight average molecular weight greater than about1000 such as Biowax®.(supplied by Biosil), polyoxyethylene glycolshaving weight average molecular weight greater than about 500 such asCarbowax (supplied by Union Carbide), and mixtures thereof. Preferredfor use herein is Biowax® 754.

Also preferred for use herein are polyoxyethylene glycols having weightaverage molecular weight greater than about 500, preferably from about1000 to about 10,000, more preferably from about 1400 to about 6000.Most preferred is PEG-32 (Carbowax 1450).

When present, the above wax materials preferably comprise from about0.1% to about 10%, preferably from about 0.1% to about 5%, mostpreferably from about 0.4% to about 2% by weight of the composition.

iii.) Powders

Also useful as degreasing agents are powders. Powder ingredients whichmay be compounded in the composition of the present invention includeinorganic powder such as gums, chalk, Fuller's earth, talc, kaolin, ironoxide, mica, sericite, muscovite, phlogopite, synthetic mica,lepidolite, biotite, lithia mica, vermiculite, magnesium carbonate,calcium carbonate, aluminum silicate, starch, smectite clays, alkyland/or trialkyl aryl ammonium smectites, chemically modified magnesiumaluminum silicate, organically modified montmorillonite clay, hydratedaluminum silicate, fumed silica, aluminum starch octenyl succinatebarium silicate, calcium silicate, magnesium silicate, strontiumsilicate, metal tungstate, magnesium, silica alumina, zeolite, bariumsulfate, calcined calcium sulfate (calcined gypsum), calcium phosphate,fluorine apatite, hydroxyapatite, ceramic powder, metallic soap (zincstearate, magnesium stearate, zinc myristate, calcium palmitate, andaluminum stearate), colloidal silicone dioxide, and boron nitride;organic powder such as polyamide resin powder (nylon powder),cyclodextrin, polyethylene powder, methyl polymethacrylate powder,polystyrene powder, copolymer powder of styrene and acrylic acid,benzoguanamine resin powder, poly(ethylene tetrafluoride) powder, andcarboxyvinyl polymer, cellulose powder such as hydroxyethyl celluloseand sodium carboxymethyl cellulose, ethylene glycol monostearate;inorganic white pigments such as titanium dioxide, zinc oxide, andmagnesium oxide. Other useful powders are disclosed in U.S. Pat. No. 5,688,831, to El-Nokaly et al., issued Nov. 18, 1997, herein incorporatedby reference in its entirety. Preferred for use herein are particulatecrosslinked hydrocarbyl-substituted polysiloxane available under thetradename Tospearl from Toshiba Silicone. Mixtures of the above powdersmay also be used.

Preferably the powders of the present invention have a particle sizesuch that the average chord length of the powder particles range fromabout 0.01 microns to about 100 microns, preferably from about 0.1microns to about 50 microns, more preferably from about 1 micron toabout 20 microns.

Preferably, the powders of the present invention are spherical orplatelet in shape for smooth skin feel. Alternatively and preferably,the powders can by amorphous or irregular shaped for a draggy skin feel.When present, powders preferably comprise from about 0.01% to about 10%,preferably from about 0.1% to about 10%, more preferably from about 0.1%to about 5%, most preferably from about 0.4% to about 2% by weight ofthe composition.

iv.) Fluorochemicals

Also useful herein are fluorochemicals. These fluorochemicals includefluorotelemers, and perfluoropolyethers, some examples of which aredescribed in Cosmetics & Toiletries, Using Fluorinated Compounds inTopical Preparations, Vol. 111, pages 47-62, (October 1996) whichdescription is incorporated herein by reference. More specific examplesof such liquid carriers include, but are not limited to,perfluoropolymethyl isopropyl ethers, perfluoropolypropylethers,acrylamide fluorinated telomer or mixtures thereof. Other more specificexamples include, but are not limited to, the polyperfluoroisopropylethers available from Dupont Performance Chemicals under the trade nameFluortress® PFPE oils.

When present, powders preferably comprise from about 0.01% to about 10%,preferably from about 0. 1% to about 2% by weight of the composition.

Whilst some materials can function either as the lipophilic skinmoisturizing agent, thickening agent therefor, or degreasing ordetackifying agent, it will be appreciated that the moisturizing,thickening and decreasing or detackifying function cannot be provided bythe same component. However, it will be understood that where thecomposition comprises three or more lipophilic skin moisturizing agents,two of said lipophilic skin moisturizing agents can also function as athickening agent, or degreasing or detackifying agent.

When a lipophilic skin moisturizing agent is employed as the mildnessenhancer in the antimicrobial compositions herein, a stabilizer may alsobe included at a level ranging from about 0.1% to about 10%, preferablyfrom about 0.1% to about 8%, more preferably from about 0.1% to about 5%by weight of the antimicrobial cleansing composition.

The stabilizer is used to form a crystalline stabilizing network in theliquid cleansing composition that prevents the lipophilic skinmoisturizer agent droplets from coalescing and phase splitting in theproduct. The network exhibits time dependent recovery of viscosity aftershearing (e.g., thixotropy).

The stabilizers used herein are not surfactants. The stabilizers provideimproved shelf and stress stability. Some preferred hydroxyl-containingstabilizers include 12-hydroxystearic acid, 9,10-dihydroxystearic acid,tri-9,10-dihydroxystearin and tri-12-hydroxystearin (hydrogenated castoroil is mostly tri-12-hydroxystearin). Tri-12-hydroxystearin is mostpreferred for use in the compositions herein. When these crystalline,hydroxyl-containing stabilizers are utilized in the cleansingcompositions herein, they are typically present at from about 0.1% to10%, preferably from 0.1% to 8%, more preferably from 0.1% to about 5%of the antimicrobial cleansing compositions. The stabilizer is insolublein water under ambient to near ambient conditions.

Alternatively, the stabilizer employed in the cleansing compositionsherein can comprise a polymeric thickener. When polymeric thickeners asthe stabilizer in the cleansing compositions herein, they are typicallyincluded in an amount ranging from about 0.01% to about 5%, preferablyfrom about 0.3% to about 3%, by weight of the composition. The polymericthickener is preferably an anionic, nonionic, cationic orhydrophobically modifier polymer selected from the group consisting ofcationic polysaccharides of the cationic guar gum class with molecularweights of 1,000 to 3,000,000, anionic, cationic, and nonionichomopolymers derived from acrylic and/or methacrylic acid, anionic,cationic, and nonionic cellulose resins, cationic copolymers ofdimethyldialkylammonium chloride, and acrylic acid, cationichomopolymers of dimethylalkylammonium chloride, cationic polyalklene andethoxypolyalkylene imines, polyethylene glycol of molecular weight from100,000 to 4,000,000, and mixtures thereof. Preferably, the polymer isselected from the group consisting of sodium polyacrylate, hydroxy ethylcellulose, cetyl hydroxy ethyl Cellulose, and Polyquaternium 10.

Alternatively, the stabilizer employed in the cleansing compositionsherein can comprise C10-C22 ethylene glycol fatty acid esters. C10-C22ethylene glycol fatty acid esters can also desirably be employed incombination with the polymeric thickeners hereinbefore described. Theester is preferably a diester, more preferably a C14-C18 diester, mostpreferably ethylene glycol distearate. When C10-C22 ethylene glycolfatty acid esters are utilized as the stabilizer in the personalcleansing compositions herein, they are typically present at from about3% to about 10%, preferably from about 5% to about 8%, more preferablyfrom about 6% to about 8% of the personal cleansing compositions.

Another class of stabilizer which can be employed in the antimicrobialcleansing compositions of the present invention comprises dispersedamorphous silica selected from the group consisting of fumed silica andprecipitated silica and mixtures thereof. As used herein the term“dispersed amorphous silica” refers to small, finely dividednon-crystalline silica having a mean agglomerate particle size of lessthan about 100 microns.

Fumed silica, which is also known as arced silica, is produced by thevapor phase hydrolysis of silicon tetrachloride in a hydrogen oxygenflame. It is believed that the combustion process creates siliconedioxide molecules which condense to form particles. The particlescollide, attach and sinter together. The result of this process is athree dimensional branched chain aggregate. Once the aggregate coolsbelow the fusion point of silica, which is about 1710° C., furthercollisions result in mechanical entanglement of the chains to formagglomerates. Precipitated silicas and silica gels are generally made inaqueous solution. See, Cabot Technical Data Pamphlet TD-100 entitled“CAB-O-SIL® Untreated Fumed Silica Properties and Functions”, October1993, and Cabot Technical Data Pamphlet TD-104 entitled “CAB-O-SIL®Fumed Silica in Cosmetic and Personal Care Products”, March 1992, bothof which are herein incorporated by reference.

The fumed silica preferably has a mean agglomerate particle size rangingfrom about 0.1 microns to about 100 microns, preferably from about 1micron to about 50 microns, and more preferably from about 10 microns toabout 30 microns. The agglomerates are composed of aggregates which havea mean particle size ranging from about 0.01 microns to about 15microns, preferably from about 0.05 microns to about 10 microns, morepreferably from about 0.1 microns to about 5 microns and most preferablyfrom about 0.2 microns to about 0.3 microns. The silica preferably has asurface area greater than 50 sq. m/gram, more preferably greater thanabout 130 sq. m./gram, most preferably greater than about 180 sq.m./gram.

When amorphous silicas are used as the stabilizer herein, they aretypically included in the cleansing compositions at levels ranging fromabout 0.1% to about 10%, preferably from about 0.25% to about 8%, morepreferably from about 0.5% to about 5%.

A fourth class of stabilizer which can be employed in the antimicrobialcleansing compositions of the present invention comprises dispersedsmectite clay selected from the group consisting of bentonite andhectorite and mixtures thereof. Bentonite is a colloidal aluminum claysulfate. See Merck Index, Eleventh Edition, 1989, entry 1062, p. 164,which is incorporated by reference. Hectorite is a clay containingsodium, magnesium, lithium, silicon, oxygen, hydrogen and flourine. SeeMerck Index, eleventh Edition, 1989, entry 4538, p. 729, which is hereinincorporated by reference.

When smectite clay is employed as the stabilizer in the cleansingcompositions of the present invention, it is typically included inamounts ranging from about 0.1% to about 10%, preferably from about0.25% to about 8%, more preferably from about 0.5% to about 5%.

Other known stabilizers, such as fatty acids and fatty alcohols, canalso be employed in the compositions herein. Palmitic acid and lauricacid are especially preferred for use herein.

Other Optional Ingredients

The compositions of the present invention can comprise a wide range ofoptional ingredients. The CTFA International Cosmetic IngredientDictionary, Sixth Edition, 1995, which is incorporated by referenceherein in its entirety, describes a wide variety of nonlimiting cosmeticand pharmaceutical ingredients commonly used in the skin care industry,which are suitable for use in the compositions of the present invention.Nonlimiting examples of functional classes of ingredients are describedat page 537 of this reference. Examples of these functional classesinclude: abrasives, anti-acne agents, anticaking agents, antioxidants,binders, biological additives, bulking agents, chelating agents,chemical additives, colorants, cosmetic astringents, cosmetic biocides,denaturants, drug astringents, emulsifiers, external analgesics, filmformers, fragrance components, humectants, opacifying agents,plasticizers, preservatives, propellants, reducing agents, skinbleaching agents, skin-conditioning agents (emollient, humectants,miscellaneous, and occlusive), skin protectants, solvents, foamboosters, hydrotropes, solubilizing agents, suspending agents(nonsurfactant), sunscreen agents, ultraviolet light absorbers, andviscosity increasing agents (aqueous and nonaqueous). Examples of otherfunctional classes of materials useful herein that are well known to oneof ordinary skill in the art include solubilizing agents, sequestrants,and keratolytics, and the like.

Water-Insoluble Substrates

The compositions of the present invention can also be, optionally,incorporated into a insoluble substrate for application to the skin suchas in the form of a treated wipe. Suitable water insoluble substratematerials and methods of manufacture are described in Riedel, “NonwovenBonding Methods and Materials,” Nonwoven World (1987); The EncyclopediaAmericana, vol. 11, pp. 147-153. vol. 21, pp. 376-383, and vol. 26, pp.566-581 (1984); U.S. Pat. No. 3,485,786 to Evans, issued Dec. 23, 1969;U.S. Pat. No. 2,862,251, to Kalwarres; U.S. Pat. No. 3,025,585,Kalwarres; U.S. Pat. No. 4,891,227, to Thaman et al., issued Jan. 2,1990; and U.S. Pat. No. 4,891,228 and U.S. Pat. No. 5,686,088 to Mitraet al., issued Nov. 11, 1997; U.S. Pat. No. 5,674,591; James et al;issued Oct. 7, 1997; all of which are herein incorporated by referencein their entirety.

Nonwoven substrates made from synthetic materials useful in the presentinvention can also be obtained from a wide variety of commercialsources. Nonlimiting examples of suitable nonwoven layer materialsuseful herein include PGI Miratec Herringbone, a patternedhydroentangled material containing about 30% rayon and 70% polyester,and having a basis weight of about 56 grams per square yard (gsy),available from PGI/Chicopee, Dayton N.J.; PGI Miratec Starburst, apatterned hydroentangled material containing about 30% rayon and 70%polyester, and having a basis weight of about 56 grams per square yard(gsy), available from PGI/Chicopee, Dayton N.J.; Novonet^(R) 149-616, athermo-bonded grid patterned material containing about 100%polypropylene, and having a basis weight of about 50 gsy, available fromVeratec, Inc., Walpole, Mass.; Novonet^(R) 149-801, a thermo-bonded gridpatterned material containing about 69% rayon, about 25% polypropylene,and about 6% cotton, and having a basis weight of about 75 gsy,available from Veratec, Inc. Walpole, Mass.; Novonet^(R) 149-191, athermo-bonded grid patterned material containing about 69% rayon, about25% polypropylene, and about 6% cotton, and having a basis weight ofabout 100 gsy, available from Veratec, Inc. Walpole, Mass.; HEFNubtex^(R) 149-801, a nubbed, apertured hydroentangled material,containing about 100% polyester, and having a basis weight of about 70gsy, available from Veratec, Inc. Walpole, Mass.; Keybak^(R) 951V, a dryformed apertured material, containing about 75% rayon, about 25% acrylicfibers, and having a basis weight of about 43 gsy, available fromPGI/Chicopee, Dayton, N.J.; Keybak^(R) 1368, an apertured material,containing about 75% rayon, about 25% polyester, and having a basisweight of about 39 gsy, available from PGI/Chicopee, Dayton, N.J.;Duralace^(R) 1236, an apertured, hydroentangled material, containingabout 100% rayon, and having a basis weight from about 40 gsy to about115 gsy, available from PGI/Chicopee, Dayton, N.J.; Duralace^(R) 5904,an apertured, hydroentangled material, containing about 100% polyester,and having a basis weight from about 40 gsy to about 115 gsy, availablefrom PGI/Chicopee, Dayton, N.J.; Sontara 8877, an aperturedhydroentangled material, containing about 50% Nylon and about 50% Pulp,and having a basis weight of about 68 gsm, available from DupontChemical Corp.

Alternatively, the water insoluble substrate can be a polymeric meshsponge as described in U.S. Pat. No. 5,650,384, incorporated byreference herein in its entirety. The polymeric sponge comprises aplurality of plies of an extruded tubular netting mesh prepared from astrong flexible polymer, such as addition polymers of olefin monomersand polyamides of polycarboxylic acids. Although these polymeric spongesare designed to be used in conjunction with a liquid cleanser, thesetypes of sponges can be used as the water insoluble substrate in thepresent invention.

Methods for Cleansing and Disinfecting the Skin

The skin antimicrobial cleansing compositions of the present inventionare useful for disinfecting and cleansing the skin. Generally, the skindisinfection and cleansing process involves topically applying to theskin a safe and effective amount of a composition of the presentinvention. The present invention can be used when cleansing processesrequiring soap and water are unavailable or inconvenient. The amount ofthe composition applied, the frequency of application and the period ofuse will vary widely depending upon the level of disinfection andcleansing desired, e.g., the degree of microbial contamination and/orskin soiling. Typical amounts of antimicrobial cleansing compositionused preferably range from about 0.1 mg/cm² to about 20 mg/cm², morepreferably from about 0.5 mg/cm² to about 10 mg/cm², and most preferablyabout 1 mg/ cm² to about 5 mg/cm² of skin area to be cleansed.Preferably, the antimicrobial cleansing compositions of the presentinvention are used to cleanse and disinfect human and/or animal skin.

The present invention also encompasses the method of applying aneffective amount of the antimicrobial cleansing compositions of thepresent invention onto non-skin surfaces, such as household surfaces,e.g., countertops, kitchen surfaces, food preparing surfaces (cuttingboards, dishes, pots and pans, and the like); major householdappliances, e.g., refrigerators, freezers, washing machines, automaticdryers, ovens, microwave ovens, dishwashers; cabinets; walls; floors;bathroom surfaces, shower curtains; garbage cans and/or recycling bins,and the like.

Article of Manufacture

The present invention also relates to an article of manufacturecomprising a dispensing container containing the antimicrobial cleansingcomposition. Said dispensing container can be constructed of any of theconventional material employed in fabricating containers, including, butnot limited to: polyethylene; polypropylene; polyacetal; polycarbonate;polyethyleneterephthalate; polyvinyl chloride; polystyrene; blends ofpolyethylene, vinyl acetate, and rubber elastomer. Other materials caninclude stainless steel and glass. A preferred container is made ofclear material, e.g., polyethylene terephthalate.

Also preferred is an article of manufacture wherein the dispensingcontainer is a spray dispenser. Said spray dispenser is any of themanually activated means for producing a spray of liquid droplets as isknown in the art. A preferred spray container is made of clear material,e.g., polyethylene terephthalate.

Preparation of the Substrate Material impregnated with antimicrobialCleansing Composition

Any method suitable for the application of aqueous or aqueous/alcoholicimpregnates, including flood coating, spray coating or metered dosing,can be used to impregnate the fibrous webs herein with the antimicrobialcleansing compositions described herein. More specialized techniques,such as Meyer Rod, floating knife or doctor blade, which are typicallyused to impregnate liquids into absorbent sheets may also be used.

The emulsion should preferably comprise from about 100% to about 400%,preferably from about 100% to about 300% by weight of the absorbentsheet.

After coating, the sheets may be folded into stacks and packaged in anyof the moisture and vapor impermeable packages known in the art.

The anti-microbial cleansing compositions of the present invention aremade via art recognized techniques for the various forms compositions.

Methods of Using the Antimicrobial Cleansing Wipes

The antimicrobial cleansing compositions and wipe of the presentinvention are useful for personal cleansing, reducing germs on skin, andproviding residual effectiveness versus microorganisms such as fungusand bacteria as well as viruses. Typically the wipe is used to apply theantimicrobial cleansing compositions to the area to be cleansed. Thewipes herein can be used for personal cleansing when the use ofcleansing products requiring water cannot be, or are inconvenient.Typical quantities of the present wipes useful for cleansing, range fromabout 1 to about 4 wipes per use, preferably from about 1 to about 2wipes per use. Typical amounts of antimicrobial cleansing compositionused range from about 4 mg/cm² to about 6 mg/cm², preferably about 5mg/cm² of skin area to be cleansed.

EXAMPLES

The following examples further describe and demonstrate embodimentswithin the scope of the present invention. In the following examples,all ingredients are listed at an active level. The examples are givensolely for the purpose of illustration and are not to be construed aslimitations of the present invention, as many variations thereof arepossible without departing from the spirit and scope of the invention.

Ingredients are identified by chemical or CTFA name.

Example 1

The following is an example of a water-insoluble substrate useful in thepresent invention.

A patterned hydroentangled non-woven substrate having a basis weight of56 gms, comprising 70% polyester and 30% rayon approximately 6.5 incheswide by 7.5 inches long with a caliper of about 0.80 mm. Optionally, thesubstrate can be pre-coated with dimethicone (Dow Corning 200 Fluid5cst) using conventional substrate coating techniques.

Example 2

An aqueous lotion was made based on the following composition:

Ingredient Amount (weight percent) Benzalkonioum Chloride (Alkaquat 0.1DMB-451) Cocamine Oxide (C10/C16 alkyl 0.5 dimethyl amine oxide; AO-1214LP supplied by Procter & Gamble Co.) Pyroglutamic Acid (pidolidone) 4(2-pyrrolidone-5 carboxylic acid) Ethanol - denatured 200 proof (SD 10alcohol 40) DC Antiform H-10 (dimethicone) 0.03 Sodium Benzoate 0.2Tetrasodium EDTA (Hampene 220) 0.1 Sodium Chloride 0.4 Perfume 0.01Water and minors q.s. NaOH or HCl for pH adjustment to pH = 3.0

In a suitable container, the pyroglutamic acid, sodium chloride andwater are added and mixed with stirring until mixture is homogeneous.Sodium benzoate, tetrasodium EDTA and cocamine oxide are then added tothe mixture with stirring and mixed until the ingredients are completelydissolved. Once dissolved, the benzalkonium chloride and DC AntiformH-10 are added to the mixture with stirring. In a separate container,the perfume and ethanol are mixed to form a premix. The premix is thenadded to the benzalkonium chloride mixture to form the aqueous lotion.The aqueous lotion is pH adjusted to about 3.0 using NaOH or HCl. Theaqueous lotion is applied to the skin in an appropriate amount todisinfect and cleanse the skin.

Alternatively, the aqueous lotion can be applied onto the substrate ofExample 1 at a lotion to wipe weight ratio of about 2:1 usingconventional substrate coating techniques for application to the skin asan antimicrobial and cleansing wipe.

Example 3

An aqueous lotion was made based on the following composition:

Ingredient Amount (weight percent) Benzalkonioum Chloride 0.1 AmmoniumLauryl Sulfate 0.6 Pyroglutamic Acid 4 (2-pyrrolidone-5 carboxylic acid)Ethanol 10 DC Antiform H-10 0.03 Sodium Benzoate 0.2 Tetrasodium EDTA0.1 Sodium Chloride 0.4 Perfume 0.01 Water and minors q.s. NaOH or HClfor pH adjustment to pH = 3.0

In a suitable container, the pyroglutamic acid, sodium chloride andwater are added and mixed with stirring until mixture is homogeneous.Sodium benzoate, tetrasodium EDTA and ammonium lauryl sulfate are thenadded to the mixture with stirring and mixed until the ingredients arecompletely dissolved. Once dissolved, the benzalkonium chloride and DCAntiform H-10 are added to the mixture with stirring. In a separatecontainer, the perfume and ethanol are mixed to form a premix. Thepremix is then added to the benzalkonium chloride mixture to form theaqueous lotion. The aqueous lotion is pH adjusted to about 3.0 usingNaOH or HCl. The aqueous lotion is applied to the skin in an appropriateamount to disinfect and cleanse the skin.

Alternatively, the aqueous lotion can be applied onto the substrate ofExample 1 at a lotion to wipe weight ratio of about 2:1 usingconventional substrate coating techniques for application to the skin asan antimicrobial and cleansing wipe.

Example 4

An aqueous lotion was made based on the following composition:

Ingredient Amount (weight percent) Benzalkonioum Chloride 0.1 AmmoniumLauryl Sulfate 0.6 Pyroglutamic Acid 4 (2-pyrrolidone-5 carboxylic acid)Ethanol 10 DC Antiform H-10 0.03 Sodium Benzoate 0.2 Tetrasodium EDTA0.1 Sodium Chloride 0.4 Tospearl 2000 2 Perfume 0.01 Water and minorsq.s. NaOH or HCl for pH adjustment to pH = 3.0

In a suitable container, the pyroglutamic acid, sodium chloride andwater are added and mixed with stirring until mixture is homogeneous.Sodium benzoate, tetrasodium EDTA and ammonium lauryl sulfate are thenadded to the mixture with stirring and mixed until the ingredients arecompletely dissolved. Once dissolved, the benzalkonium chloride and DCAntiform H-10 are added to the mixture with stirring. In a separatecontainer, the perfume and ethanol are mixed to form a premix. Thepremix is then added to the benzalkonium chloride mixture to form theaqueous lotion. Next, the Tospearl is added into the aqueous lotion withstirring until homogeneous. The aqueous lotion is pH adjusted to about3.0 using NaOH or HCl. The aqueous lotion is applied to the skin in anappropriate amount to disinfect and cleanse the skin.

Alternatively, the aqueous lotion can be applied onto the substrate ofexample 1 at a lotion to wipe weight ratio of about 2:1 usingconventional substrate coating techniques for application to the skin asan antimicrobial and cleansing wipe.

What is claimed is:
 1. An antimicrobial cleansing composition,comprising: (a) from about 0.001% to about 5% by weight of anantimicrobial active selected from the group consisting of benzalkoniumchloride, N-(3-chloroallyl) hexaminium chlorides, methylbenzathonium;2,4,4′-trichloro-2′-hydroxy-diphenyl ether;3,4,4′-Trichlorocarbanilides; zinc pyrithione; para-chloro-meta-xylenol;and mixtures thereof; (b) from about 0.01% to about 20% by weight of anamphoteric surfactant; (c) from about 0.1% to about 20% by weight of2-pyrrolidone-5 carboxylic acid; and (d) from about 3% to about 99% byweight of an aqueous component, wherein the composition has a pH in therange of about 2.0 to about 5.5.
 2. An antimicrobial cleansingcomposition according to claim 1 wherein the antimicrobial active isselected from the group consisting of Benzalkonium Chloride,Di(C₆-C₁₄)alkyl di short chain (C₁₋₄ alkyl and/or hydroxyalkyl),N-(3-chloroallyl) hexaminium chlorides, Methylbenzethonium and mixturesthereof.
 3. An antimicrobial cleansing composition according to claim 2wherein the antimicrobial active is Benzalkonium chloride.
 4. Anantimicrobial cleansing composition according to claim 1 wherein theamphoteric surfactant is selected from surfactant compounds of thefollowing formula(s): wherein R¹ is an alkyl, alkenyl, aryl, orhydroxyalkyl radical of from about 8 to about 22 carbon atoms,optionally interrupted with up to about 10 ethylene oxide moietiesand/or 1 glyceryl moiety, R² and R³ are individually selected from alkyland monohydroxyalkyl groups containing from about 1 to about 3 carbonatoms, R⁴ is alkylene, or hydroxyalkylene of from about 1 to about 4carbon atoms, Z¹ is a radical selected from carboxylate, sulfonate,sulfate, phosphate, or phosphonate, x is 0 or 1, n is from about 1 toabout 6, and m is 0 or
 1. 5. An antimicrobial cleansing compositionaccording to claim 4 wherein the amphoteric surfactant is selected fromthe group consisting of amide betaines, amide sulfo betaines, alkylbetaines, alkenyl betaines, sultaines (sulfo betaines), imidazoliniumbetaines, cocoamphocarboxypropionate, cocoamphocarboxypropionic acid,cocoamphocarboxyglycinate, cocoamphoacetate, N-lauryl-beta-aminopropionic acid, N-lauryl-beta-imino-dipropionic acid, amine oxides,tertiary phosphine oxides, dialkyl sulfoxides, salts thereof andmixtures thereof.
 6. An antimicrobial cleansing composition according toclaim 4 wherein the amphoteric surfactant has the following formula:

wherein R¹⁰ or R¹² is methyl, ethyl, or hydroxyethyl, and R¹¹ is C₈-C₂₂alkyl, alkenyl, or aryl, or CH₃(CH₂)_(p)CONH(CH₂)_(q) wherein p is 8-22and q is 1-6.
 7. An antimicrobial cleansing composition according toclaim 1 further comprising a mildness enhancer.
 8. An antimicrobialcleansing composition according to claim 7 wherein the mildness enhanceris selected from the group consisting of cationic and nonionic polymers,co-surfactants, moisturizers and mixtures thereof.
 9. An antimicrobialcleansing composition according to claim 8 wherein the moisturizer is alipid skin moisturizer.
 10. An antimicrobial cleansing compositionaccording to claim 9 wherein the lipid skin moisturizer is selected fromthe group consisting of hydrocarbon oils and waxes, silicones, fattyacid derivatives, cholesterol, cholesterol derivatives, di- andtri-glycerides, vegetable oils, vegetable oil derivatives, liquidnondigestible oils, blends of liquid digestible or nondigestible oilswith solid polyol polyesters, acetoglyceride esters, alkyl esters,alkenyl esters, lanolin and its derivatives, milk tri-glycerides, waxesters, beeswax derivatives, sterols, phospholipids and mixturesthereof.
 11. An antimicrobial cleansing composition according to claim10 wherein the lipid skin moisturizer is Petrolatum.
 12. A method forcleansing and disinfecting skin comprising the applying a safe andeffective amount of the composition of claim 1 on mammalian skin.
 13. Anantimicrobial cleansing wipe, comprising: (a) one or more layers ofwater-insoluble substrate; and (b) a safe and effective amount ofantimicrobial cleansing composition, comprising by weight of theantimicrobial composition: (i) from about 0.001% to about 5% of anantimicrobial agent selected from the group consisting of benzalkoniumchloride, N(3-chloroallyl) hexaminium chlorides, methylbenzethonium;2,4,4′-trichloro-2′-hydroxydiphenyl ether; 3,4,4′-Trichlorocarbanilides;zinc pyrithione; para-chloro-meta-xylenol; and mixtures thereof; (ii)from about 0.01% to about 20% of an amphoteric surfactant: (iii) fromabout 0.1% to about 20% of 7-pyrrolidone-5 carboxylic acid; and (iv)from about 3% to about 99% of an aqueous component; wherein thecomposition has a pH in the range of about 2.0 to about 5.5.
 14. Amethod for cleansing and disinfecting skin comprising the applying theantimicrobial cleansing wipe of claim 13 on mammalian skin.